Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1979-02-28
1980-12-16
Prescott, Arthur C.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204180R, G01N 2726, G01N 2728, G01N 2730
Patent
active
042396123
ABSTRACT:
A light source illuminates particles migrating in an electrophoresis chamber under the influence of a reversing polarity electric field applied between a pair of spaced electrodes which are in the form of thin conductive layers deposited on opposed end portions of the chamber. The light reflected from the particles migrating along the stationary layer of the chamber is imaged onto a circumferentially arranged grating on a transparent rotating disk and modulated thereby. The modulated reflected particle light image is then applied to a photomultiplier tube which in response produces a spectral output signal which is subsequently applied to a frequency translating circuit where it is heterodyned down to the zero frequency region and offset relative to a reference frequency such that the heterodyned signal has a frequency content which is related to mean mobility and a polarity with respect to the offset reference frequency which serves as an indication of the polarity of the charge of the particles migrating in the chamber. A Real Time Analyzer or a frequency tracking circuit may be employed to convert the translator output signal to a mobility histogram or to an accurate measurement of mean mobility, respectively.
REFERENCES:
patent: 2744061 (1956-05-01), DeFord et al.
patent: 3522162 (1970-07-01), Davies
patent: 3718556 (1973-02-01), Rohrback
patent: 3759816 (1973-09-01), Pretorius et al.
patent: 3788969 (1974-01-01), DiStefano et al.
Bender S. Michael
Pen Kem, Inc.
Prescott Arthur C.
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