Automatic cleaning of MALDI ion sources

Radiant energy – Ionic separation or analysis – With sample supply means

Reexamination Certificate

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C250S424000, C250S425000

Reexamination Certificate

active

07989762

ABSTRACT:
In an ion source that generates ions by matrix-assisted laser desorption (MALDI), ion acceleration diaphragms having apertures though which ions are accelerated and which have become contaminated by matrix material, are cleaned by temporarily heating the diaphragms. During the cleaning process, the sample support plate is moved aside but remains in the ion source housing, and the heating is preferably limited to regions surrounding the apertures in the diaphragms. In one embodiment, the diaphragms are heated by irradiation generated by infrared laser diodes.

REFERENCES:
patent: 6504150 (2003-01-01), Verentchikov et al.
patent: 6953928 (2005-10-01), Vestal et al.
patent: 6992311 (2006-01-01), Ring et al.
patent: 7109480 (2006-09-01), Vestal et al.
patent: 7297942 (2007-11-01), Holle et al.
patent: 7541597 (2009-06-01), Holle et al.
patent: 2005/0092916 (2005-05-01), Vestal et al.
patent: 2006/0192106 (2006-08-01), Hayden et al.
patent: 2006/0255256 (2006-11-01), Hayden et al.
patent: 2006/0255294 (2006-11-01), Martin, II
patent: 2008/0010845 (2008-01-01), Bailey et al.
patent: 2008/0272286 (2008-11-01), Vestal
patent: 103 16 655 (2004-08-01), None
patent: 103 16 655 (2007-11-01), None

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