Chemistry: electrical and wave energy – Apparatus – Electrolytic
Patent
1992-09-10
1994-06-28
Gorgos, Kathryn
Chemistry: electrical and wave energy
Apparatus
Electrolytic
204225, C25D 1716
Patent
active
053244060
ABSTRACT:
An automatic electrodeposition apparatus is disclosed. The desired substrate is brush plated by moving the brush on top of the plate. The brush may be selectively, and sequentially supplied with any one of a number of working solutions comprising conventional cleaning and plating solutions. De-ionized water and pressurized air may also be selectively fed to the brush for cleaning at desired time or job intervals throughout operation of the machine. A programmable logic controller controls feed of working solution, water, and air flow to the brush. It also controls brush movement and monitors electrodeposition through measurement of ampere-hours spent during operation.
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Anderson Edward M.
Blazic Martin L.
Lannutti Susan M.
Gorgos Kathryn
Tosoh SMD, Inc.
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