Automated wafer defect inspection system and a process of...

Image analysis – Applications – Manufacturing or product inspection

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C382S145000, C382S149000, C348S126000, C348S086000, C438S016000

Reexamination Certificate

active

06937753

ABSTRACT:
An automated defect inspection system has been invented and is used on patterned wafers, whole wafers, broken wafers, partial wafers, sawn wafers such as on film frames, JEDEC trays, Auer boats, die in gel or waffle packs, MCMs, etc. and is specifically intended and designed for second optical wafer inspection for such defects as metalization defects (such as scratches, voids, corrosion, and bridging), diffusion defects, passivation layer defects, scribing defects, glassivation defects, chips and cracks from sawing, solder bump defects, and bond pad area defects.

REFERENCES:
patent: 4328553 (1982-05-01), Fredriksen et al.
patent: 4464705 (1984-08-01), Horowitz
patent: 4595289 (1986-06-01), Feldman et al.
patent: 4644172 (1987-02-01), Sandland et al.
patent: 4681442 (1987-07-01), Wagner
patent: 4823394 (1989-04-01), Berkin et al.
patent: 5091963 (1992-02-01), Litt et al.
patent: 5153668 (1992-10-01), Katzir et al.
patent: 5497381 (1996-03-01), O'Donoghue et al.
patent: 5640200 (1997-06-01), Michael
patent: 5641960 (1997-06-01), Okubo et al.
patent: 5787190 (1998-07-01), Peng et al.
patent: 5822055 (1998-10-01), Tsai et al.
patent: 5850466 (1998-12-01), Schott
patent: 5856844 (1999-01-01), Battermann et al.
patent: 5861910 (1999-01-01), McGarry et al.
patent: 5917588 (1999-06-01), Addiego
patent: 5949901 (1999-09-01), Nichani et al.
patent: 6064517 (2000-05-01), Chuang et al.
patent: 6288780 (2001-09-01), Fairley et al.
patent: 6324298 (2001-11-01), O'Dell et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Automated wafer defect inspection system and a process of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Automated wafer defect inspection system and a process of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Automated wafer defect inspection system and a process of... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3480905

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.