Image analysis – Applications – Manufacturing or product inspection
Patent
1998-02-20
2000-07-18
Mehta, Bhavesh
Image analysis
Applications
Manufacturing or product inspection
348125, G06K 900
Patent
active
060918470
ABSTRACT:
Apparatus for detecting etch defects in an object having a plurality of openings by generating an image signal of the object representing light intensity values of a plurality of pixels, processing the image signal to form data signals representing light intensity values of groups of pixels, filtering the data signals to remove signals representing the ends of the openings, and pairing two data signals when the groups of pixels represented thereby represent an etch defect.
REFERENCES:
patent: 5465308 (1995-11-01), Hutcheson et al.
patent: 5467402 (1995-11-01), Okuyama et al.
patent: 5488674 (1996-01-01), Burt et al.
patent: 5579444 (1996-11-01), Dalziel et al.
Chiu Chinchuan
Ishii Fusao
Leary Michael
Marcanio Joseph A.
Paolella Philip
Frommer William S.
Mehta Bhavesh
Sony Corporation
Sony Electronics Inc.
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