Automated system utilizing self-labeled target by pitch encoding

Details Automated system utilizing self-labeled target by pitch encoding Automated system utilizing self-labeled target by pitch encoding

1996-10-08

1998-03-24

Font, Frank G.

Optics: measuring and testing

By polarized light examination

With light attenuation

356401, G01B 1114, G01B 1100

Patent

active

057318778

ABSTRACT:
An automated system utilizes self-labeled targets to locate and identify specific targets. Lithographic targets used for alignment, measurement and/or testing of features on a semiconductor substrate are assigned a unique pitch to identify the target. The targets have a plurality of elements with at least three edges distinguishable by an optical metrology tool. An invariant and unique process characteristic is defined by distances between elements or three or more edges, which is the pitch of the target. An optical metrology tool having a microprocessor and memory resolves the target elements, measures the distance between elements or edges, calculates the target pitch, compares it to the target pitch in memory, and determines whether the actual target pitch equals the stored target pitch to identify the target on the substrate.

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