Chemistry: electrical and wave energy – Apparatus – Electrolytic
Patent
1982-09-30
1984-02-21
Tufariello, T. M.
Chemistry: electrical and wave energy
Apparatus
Electrolytic
204210, C25D 1700
Patent
active
044328559
ABSTRACT:
A laser enhanced electroplating system or etching system or conventional electroplating or etching system includes a continuous electrochemical processing system with a sheet of material to be treated electrochemically passed from a supply roller to a plating bath and out over an exit roller with the plating system under automatic control. A rinse-tank is also proved in series with the plating tank. The sheet to be treated electrochemically can be coated with a protective film which prevents electrochemical action from occurring where it is present, but which sheet can be removed in a predetermined location. One removes the protective film where desired to provide a mask by means of a laser which is scanned under automatic control. Then the plating or etching operation occurs through the openings in the mask. A rinse-tank contains a solvent capable of removing the mask from the sheet subsequent to the plating or etching operation. An array of lasers can be employed. An array of lasers can be multiplexed, synchronously activated or pulsed. The electrochemical operation can be performed with the concomitant application of energy from the laser in order to enhance the chemical action in areas from which the masking (protective) film has been removed. The laser can be scanned by means of a mirror, which oscillates or can be fixed. The masking material is composed of an organic material such as glycol phthalate, paraffin, photoresist, gelatin, etc.
REFERENCES:
patent: 3791938 (1974-02-01), Healy
patent: 4217183 (1980-08-01), Melcher
Romankiw Lubomyr T.
von Gutfeld Robert J.
International Business Machines - Corporation
Jones II Graham S.
Tufariello T. M.
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