Etching a substrate: processes – Nongaseous phase etching of substrate
Patent
1993-10-05
1995-06-20
Powell, William
Etching a substrate: processes
Nongaseous phase etching of substrate
216 52, B44C 122, C23F 102
Patent
active
054258405
ABSTRACT:
A process for making plates from a photopolymer sheet which has been pre-exposed to ultraviolet radiation for conversion into printing plates for flexography, letterpress or dry-offset printing, includes the steps of inserting the sheet into an apparatus, sensitive side facing upwards and at high speed, so that the sheet is received on an etching plane and beneath a set of brushes, and etching the sheet under forces resulting from alternating movement of the brushes and to-and-fro movement of the brushes in a horizontal direction perpendicular to the alternating movement of the brushes. The sheet is automatically held in position during etching. Also disclosed is an apparatus for implementing this process, allowing for very rapid etching.
REFERENCES:
patent: 3169066 (1965-02-01), Hoerner
patent: 3271226 (1966-09-01), Staehle et al.
patent: 3411973 (1968-11-01), Siler
Photomeca
Powell William
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