Automated photomask inspection apparatus and method

Optics: measuring and testing – For optical fiber or waveguide inspection

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356237, G01N 2188

Patent

active

055637027

ABSTRACT:
A method and apparatus for inspecting patterned transmissive substrates, such as photomasks, for unwanted particles and features occurring on the transmissive, opaque portions and at the transition regions of the opaque and transmissive portions of the substrate. A transmissive substrate is illuminated by a laser through an optical system comprised of a laser scanning system, individual transmitted and reflected light collection optics and detectors collect and generate signals representative of the light transmitted and reflected by the substrate as the substrate is scanned repeatedly in one axis in a serpentine pattern by a laser beam which is focused on the patterned substrate surface. The defect identification of the substrate is performed using only those transmitted and reflected light signals, and other signals derived from them, such as the second derivative of each of them. The actual defect identification is then performed by comparing combinations of at least two of those measured and derived signals. Simultaneously, defect and particle inspection using the same measured transmitted and reflected light signals. Additionally, phase shift and line widths on the substrate can also be performed simultaneously using the same transmitted light signal that is collected for defect analysis.

REFERENCES:
patent: 3851951 (1974-12-01), Eveleth
patent: 4247203 (1981-01-01), Levy et al.
patent: 4579455 (1986-04-01), Levy et al.
patent: 4633504 (1986-12-01), Wihl
patent: 4644172 (1987-02-01), Sandland et al.
patent: 4669885 (1987-06-01), Ina
patent: 4805123 (1989-02-01), Specht et al.
patent: 4926489 (1990-05-01), Danielson et al.
Teiji Katsuta, Automatic Inspection of Contaminants on Reticles, SPIE vol. 470, Optical Microlithography III, Technology for the Next Decade (1984), pp. 233-239.
Robert M. Haralick, et al., Image Analysis Using Mathematical Morphology, IEEE Transactions on Pattern Analysis and Machine Intelligence, vol. PAMI-9, No. 4, Jul. 1987, pp. 332-350.
Anil K. Jain, Image Analysis and Computer Vision, Fundamentals of Digital Image Processing, Chapter 9, (1989), pp. 384-389.
James A. Freeman, et al., Neural Networks Algorithms, Applications, and Programming Techniques, Backpropagation, Chapter 3, (1992), pp. 89-125.

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