Image analysis – Applications – Manufacturing or product inspection
Patent
1994-02-25
1996-11-05
Couso, Yon J.
Image analysis
Applications
Manufacturing or product inspection
382145, 356398, G06K 900
Patent
active
055725988
ABSTRACT:
An automated photomask inspection apparatus including an XY state (12) for transporting a substrate (14) under test in a serpentine path in an XY plane, an optical system (16) comprising a laser (30), a transmission light detector (34), a reflected light detector (36), optical elements defining reference beam paths and illuminating beam paths between the laser, the substrate and the detectors and an acousto-optical beam scanner (40, 42) for reciprocatingly scanning the illuminating and reference beams relative to the substrate surface, and an electronic control, analysis and display system for controlling the operation of the stage and optical system and for interpreting and storing the signals output by the detectors. The apparatus can operate in a die-to-die comparison mode or a die-to-database mode.
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Fein Michael E.
Fu Tao-Yi
Kvamme Damon F.
Wihl Mark J.
Zywno Marek
Couso Yon J.
Hamrick Claude A. S.
KLA Instruments Corporation
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