Automated particle monitor operation for a thin film process

Details Automated particle monitor operation for a thin film process Automated particle monitor operation for a thin film process

1997-09-04

1999-08-24

Raevis, Robert

Measuring and testing

Instrument proving or calibrating

Gas or liquid analyzer

G01N 100

Patent

active

059426721

ABSTRACT:
A method of calibrating a particle monitor prior to applying DC power to a cathode in the processing chamber by first, initiating a flow of gas to the processing chamber. Next, the operation of the particle monitor is initiated to obtain a particle count within the flow of gas in the processing chamber. If the particle monitor detects a particle count in excess of a minimum value, the operation of the particle monitor is adjusted to reduce the particle count to the minimum value. During production, the particle monitor count is initiated by a particle monitor control only after the particle monitor control detects an occurrence of both a first signal generated in response to initiating a flow of gas to the processing chamber and, a second signal generated in response to the application of power to a cathode within the processing chamber.

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