Automated overlay metrology system

Details Automated overlay metrology system Automated overlay metrology system

2005-12-27

2008-05-06

Young, Christopher G. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

C430S030000, C356S399000, C356S400000

Reexamination Certificate

active

07368206

ABSTRACT:
Non-imaging measurement is made of misalignment of lithographic exposures by illuminating periodic features of a mark formed by two lithographic exposures with broadband light and detecting an interference pattern at different wavelengths using a specular spectroscopic scatterometer including a wavelength dispersive detector. Misalignment can be discriminated by inspection of a spectral response curve and by comparison with stored spectral response curves that may be empirical data or derived by simulation. Determination of best fit to a stored spectral curve, preferably using an optimization technique can be used to quantify the detected misalignment. Such a measurement may be made on-line or in-line in a short time while avoiding tool induced shift, contact with the mark or use of a tool requiring high vacuum.

REFERENCES:
patent: 4371264 (1983-02-01), Lacombat et al.
patent: 5216257 (1993-06-01), Brueck et al.
patent: 5468580 (1995-11-01), Tanaka
patent: 5701013 (1997-12-01), Hsia et al.
patent: 5757507 (1998-05-01), Ausschnitt et al.
patent: 5776640 (1998-07-01), Bae
patent: 5776645 (1998-07-01), Barr et al.
patent: 5805290 (1998-09-01), Ausschnitt et al.
patent: 5989761 (1999-11-01), Kawakubo et al.
patent: 6458605 (2002-10-01), Stirton
patent: 6699624 (2004-03-01), Niu et al.
patent: 2002/0135875 (2002-09-01), Niu et al.
patent: 2002/0158193 (2002-10-01), Sezginer et al.
patent: 2001-272208 (2001-10-01), None
patent: WO 02/25723 (2002-03-01), None
patent: WO 02/069390 (2002-09-01), None
Article titled “Light Diffraction Based Overlay Measurement”; J. Bischoff et al. dated 2001.
Article titled “Diffractive techniques for lithographic process monitoring and control”; S. Sohail et al. dated 1994.
Article titled “Specular Spectroscopic Scatterometry in DUV Lithography”; Nickhil et al. dated Mar. 1999.
X. Niu et al.; “Specular Spectroscopic Scatterometry in DUV Lithography”; SPIE Vol. 3877; Mar. 1999; pp. 159-168.

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