Automated overlay metrology system

Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S030000, C356S399000, C356S400000

Reexamination Certificate

active

07368206

ABSTRACT:
Non-imaging measurement is made of misalignment of lithographic exposures by illuminating periodic features of a mark formed by two lithographic exposures with broadband light and detecting an interference pattern at different wavelengths using a specular spectroscopic scatterometer including a wavelength dispersive detector. Misalignment can be discriminated by inspection of a spectral response curve and by comparison with stored spectral response curves that may be empirical data or derived by simulation. Determination of best fit to a stored spectral curve, preferably using an optimization technique can be used to quantify the detected misalignment. Such a measurement may be made on-line or in-line in a short time while avoiding tool induced shift, contact with the mark or use of a tool requiring high vacuum.

REFERENCES:
patent: 4371264 (1983-02-01), Lacombat et al.
patent: 5216257 (1993-06-01), Brueck et al.
patent: 5468580 (1995-11-01), Tanaka
patent: 5701013 (1997-12-01), Hsia et al.
patent: 5757507 (1998-05-01), Ausschnitt et al.
patent: 5776640 (1998-07-01), Bae
patent: 5776645 (1998-07-01), Barr et al.
patent: 5805290 (1998-09-01), Ausschnitt et al.
patent: 5989761 (1999-11-01), Kawakubo et al.
patent: 6458605 (2002-10-01), Stirton
patent: 6699624 (2004-03-01), Niu et al.
patent: 2002/0135875 (2002-09-01), Niu et al.
patent: 2002/0158193 (2002-10-01), Sezginer et al.
patent: 2001-272208 (2001-10-01), None
patent: WO 02/25723 (2002-03-01), None
patent: WO 02/069390 (2002-09-01), None
Article titled “Light Diffraction Based Overlay Measurement”; J. Bischoff et al. dated 2001.
Article titled “Diffractive techniques for lithographic process monitoring and control”; S. Sohail et al. dated 1994.
Article titled “Specular Spectroscopic Scatterometry in DUV Lithography”; Nickhil et al. dated Mar. 1999.
X. Niu et al.; “Specular Spectroscopic Scatterometry in DUV Lithography”; SPIE Vol. 3877; Mar. 1999; pp. 159-168.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Automated overlay metrology system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Automated overlay metrology system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Automated overlay metrology system will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3981540

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.