Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing
Reexamination Certificate
2006-08-08
2006-08-08
Young, Christopher G. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Registration or layout process other than color proofing
C430S030000
Reexamination Certificate
active
07087352
ABSTRACT:
Non-imaging measurement is made of misalignment of lithographic exposures by illuminating periodic features of a mark formed by two lithographic exposures with broadband light and detecting an interference pattern at different wavelengths using a specular spectroscopic scatterometer including a wavelength dispersive detector. Misalignment can be discriminated by inspection of a spectral response curve and by comparison with stored spectral response curves that may be empirical data or derived by simulation. Determination of best fit to a stored spectral curve, preferably using an optimization technique can be used to quantify the detected misalignment. Such a measurement may be made on-line or in-line in a short time while avoiding tool induced shift, contact with the mark or use of a tool requiring high vacuum.
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patent: WO 02/069390 (2002-09-01), None
Article titled “Light Diffraction Based Overlay Measurement”; J. Bischoff et al. dated 2001.
Article titled “Diffractive techniques for lithographic process monitoring and control”; S. Sohail et al. dated 1994.
Article titled “Specular Spectroscopic Scatterometry in DUV Lithography”; Nickhil et al. dated Mar. 1999.
Aiver Arun A.
Fay Bernard
Nikon Corporation
Whitham Curtis & Christofferson, P.C.
Young Christopher G.
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