Automated method for joining wafers

Metal fusion bonding – Process – Using only pressure

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414404, 414416, 414938, 437925, H01L 2130

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active

053141075

ABSTRACT:
A method for joining a number of first and second wafers (11,12) having one polished surface in preparation for direct wafer bonding is provided. The method involves placing a number of first (11) and the same number of second (12) wafers into slots (16) of a retainer (14) so that each of the polished surfaces of the number of first wafers (11) is forced to contact one of the polished surfaces of the number of second wafers (12).

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