Automated mask alignment for UV projection expose system

Optics: measuring and testing – By alignment in lateral direction – With light detector

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Details

356373, 356375, G01B 1100

Patent

active

055528910

ABSTRACT:
An apparatus for aligning an image on a substrate support. A substrate support supports a substrate to be treated by radiation. At least one radiation source produces desired wavelengths of radiation to treat the substrate. The radiation is directed toward the substrate support. At least one filter filters selected wavelengths of the radiation. The filter is positioned between the substrate support and the radiation source. A mask selectively transmits the radiation. The mask is positioned between the radiation source and the substrate support. At least one detector detects a position of radiation impinging upon the substrate support and produces a signal corresponding to the sensed position. The detected position is compared with a desired position of radiation impinging upon the substrate support. The detected position is compared to the desired position and a signal is produced corresponding to the comparison. A positioner positions the substrate support in a desired position for treating the substrate. The positioning means receives the signal from the comparing means and alters, when necessary, in a direction parallel to a surface of a substrate supported by the substrate support, the position of the substrate support and the radiation source, mask, and filter relative to each other in accordance with the signal so that the sensed position corresponds to the desired position.

REFERENCES:
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patent: 4672209 (1987-06-01), Karasaki et al.
patent: 4690529 (1987-09-01), Sugiyama et al.
patent: 4853756 (1989-08-01), Matsuki
patent: 5137363 (1992-08-01), Kosugi et al.
patent: 5268744 (1993-12-01), Mori et al.

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