Electrolysis: processes – compositions used therein – and methods – Electrolytic analysis or testing – Tracking chemical reactions
Reexamination Certificate
2005-05-31
2005-05-31
Noguerola, Alex (Department: 1753)
Electrolysis: processes, compositions used therein, and methods
Electrolytic analysis or testing
Tracking chemical reactions
C205S081000, C204S434000
Reexamination Certificate
active
06899805
ABSTRACT:
A method for determining the concentration of an additive X of an electrochemical bath that includes at least one further component Y is set forth. In accordance with the method, a predetermined amount of a starting solution is provided. The starting solution comprises virgin makeup solution that is saturated with the further additive, or forms a mixed solution that is saturated with the further additive when combined with an amount of the electrochemical bath for measurement that is extracted for measurement. A predetermined amount of the extracted electrochemical bath is then added to the predetermined amount of the starting solution to form the mixed solution. At least one electroanalytical measurement cycle it is then executed using the mixed solution and the results of the measurement cycle are compared with a known measurement standard.
REFERENCES:
patent: 3649509 (1972-03-01), Morawetz et al.
patent: 3878066 (1975-04-01), Dettke et al.
patent: 3904493 (1975-09-01), Losi et al.
patent: 4055751 (1977-10-01), Bussmann et al.
patent: 4090926 (1978-05-01), Matson
patent: 4132605 (1979-01-01), Tench et al.
patent: 4146437 (1979-03-01), O'Keefe
patent: 4229218 (1980-10-01), Gulla et al.
patent: 4324589 (1982-04-01), Gulla et al.
patent: 4326940 (1982-04-01), Eckles et al.
patent: 4541902 (1985-09-01), Kinoshita et al.
patent: 4834842 (1989-05-01), Langner et al.
patent: 4886590 (1989-12-01), Tittle
patent: 4895739 (1990-01-01), Bladon
patent: 4917774 (1990-04-01), Fisher
patent: 4917777 (1990-04-01), Fisher
patent: 4948473 (1990-08-01), Phillippi
patent: 4952286 (1990-08-01), Bladon et al.
patent: 5007990 (1991-04-01), Bladon
patent: 5192403 (1993-03-01), Chang et al.
patent: 5196096 (1993-03-01), Chang et al.
patent: 5223118 (1993-06-01), Sonnenberg et al.
patent: 5234573 (1993-08-01), Takami
patent: 5364510 (1994-11-01), Carpio
patent: 5368715 (1994-11-01), Hurley et al.
patent: 5372293 (1994-12-01), Corlay et al.
patent: 5389215 (1995-02-01), Horiuchi et al.
patent: 5391271 (1995-02-01), Ludwig
patent: 5484626 (1996-01-01), Storjohann et al.
patent: 5509772 (1996-04-01), Doche
patent: 5534128 (1996-07-01), Aso et al.
patent: 6113769 (2000-09-01), Uzoh et al.
patent: 6254760 (2001-07-01), Shen et al.
patent: 6280602 (2001-08-01), Robertson
patent: 6288561 (2001-09-01), Leedy
patent: 6318951 (2001-11-01), Schmidt et al.
patent: 6365033 (2002-04-01), Graham et al.
patent: 6471845 (2002-10-01), Dukovic et al.
patent: 6551479 (2003-04-01), Graham et al.
patent: WO 99/57549 (1999-11-01), None
Z. Sun et al..,Optimized Bath Control for Void-Free Copper Deposition. Solid State Technology, pp. 1-10, Nov. 2001.
Dennis Tench and John White.Cyclic Pulse Voltammetric Stripping Analysis of Acid Copper Plating Baths, Journal of the Electromechanical Society, vol. 132, No. 4, pp. 831-834. Apr. 1985.
Hobart H. Willard, et al.,Instrumental Methods of Analysis. Fifth Edition. D. Van Nostrand Company, New York, N.Y.. pp. 647-656. 1974.
Frederick A. Lowenheim.Electroplating. McGraw-Hill Book Company, pp. 120 & 121. 1979.
Chen Lin-Lin
Graham Lyndon W.
Edell Shapiro & Finnan LLC
Noguerola Alex
Semitool Inc.
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