Autofocus system

Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems

Reexamination Certificate

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Details

C250S201400, C250S559290, C396S089000

Reexamination Certificate

active

06624403

ABSTRACT:

BACKGROUND OF THE INVENTION
A number of optical metrology devices now exist for characterizing the composition and structure of semiconductor wafers. Many of these systems include measurement beams which must be focused to very small spots to study very small features on the wafers. In order to maintain such small spots, an accurate autofocus system is required.
In the past, the optical metrology devices of the assignee included an autofocus system based on a Foucalt knife test principal. This mechanism is described in U.S. Pat. No. 5,978,074 incorporated by reference. This system included a rotating chopper wheel. It would be desirable to develop a system which did not require moving parts.
Other autofocus systems are described in U.S. Pat. Nos. 5,910,842 and 6,502,478,both incorporated herein by reference.
SUMMARY OF THE INVENTION
An autofocus system is disclosed for driving a sample into the focal plane of a primary microscope objective. A light source, preferably a laser, generates a collimated monitor beam which is focused onto the sample through the primary objective. The reflected beam passes back through the primary objective and is directed to a secondary focusing element. The beam is then split by a reflective wedge into two portions with different path lengths such that the beam waists of the two portions are spatially separated. An aperture is located between the two beam waists and equidistant therefrom when the sample is in focus. This location is also approximately where the two beams intersect.
A photodetector, preferably a bi-cell, is provided to measure the intensity of the two beam portions transmitted by the aperture. The measured intensity levels vary with respect to the position of the sample. By comparing the measured intensity levels, an indication of the position of the sample can be obtained. This indication can be used as a feedback signal to correct the position of the sample with respect to the primary objective.


REFERENCES:
patent: 4631397 (1986-12-01), Ohsato et al.
patent: 4845352 (1989-07-01), Benschop
patent: 5910842 (1999-06-01), Piwonka-Corle et al.
patent: 5978074 (1999-11-01), Opsal et al.
patent: 6052478 (2000-04-01), Wihl et al.

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