Chemistry: electrical current producing apparatus – product – and – Current producing cell – elements – subcombinations and... – Include electrolyte chemically specified and method
Patent
1995-03-14
2000-11-21
Kalafut, Stephen
Chemistry: electrical current producing apparatus, product, and
Current producing cell, elements, subcombinations and...
Include electrolyte chemically specified and method
429144, 429338, 429340, 429341, 4292181, 4292315, H01M 1040, H01M 448, H01M 216
Patent
active
061500577
ABSTRACT:
An autoclavable elctrochemical cell which may be used in an implantable medical device. The anode active material is lithium or other material from groups IA and IIA of the Periodic Table and having a melting point greater than about 150 degrees C. The cathode active material is silver vanadium oxide or other metal oxide or carbon monoflouride. The solvent for the electrolyte has a boiling point greater than about 100 degrees C. and a dielectric constant greater than about 5 so that the cell may be dimensionally and chemically stable during repeated exposures of about one hour each to the autoclaving temperatures.
REFERENCES:
patent: 3393092 (1968-07-01), Shaw et al.
patent: 3544385 (1970-12-01), Newman
patent: 4060674 (1977-11-01), Klemann et al.
patent: 4201838 (1980-05-01), Goldberg
patent: 4310609 (1982-01-01), Liang et al.
patent: 4762758 (1988-08-01), Shuster et al.
patent: 4830940 (1989-05-01), Keister et al.
patent: 4865932 (1989-09-01), Masuda et al.
patent: 5114811 (1992-05-01), Ebel et al.
patent: 5154992 (1992-10-01), Berberick et al.
patent: 5176968 (1993-01-01), Blasi et al.
Search Report (Date Unknown).
Kalafut Stephen
Wilson Greatbatch Ltd.
LandOfFree
Autoclavable electrochemical cell does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Autoclavable electrochemical cell, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Autoclavable electrochemical cell will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1254859