Optics: measuring and testing – By alignment in lateral direction
Patent
1982-04-02
1986-10-07
Rosenberger, R. A.
Optics: measuring and testing
By alignment in lateral direction
356400, G01B 1100
Patent
active
046156216
ABSTRACT:
An auto-focusing alignment and measurement system for use in precisely positioning a semiconductor substrate with respect to an integrated circuit mask is herein disclosed. This system includes a moveable convergent lens operable with another pair of convergent lenses for alternately focusing images of the mask and the substrate onto a photodiode array. The photodiode array serves as a focus detector and, together with associated signal processing circuitry, provides a feedback signal for controlling displacement of the moveable lens to equal the separation between the mask and the substrate with an accuracy better than the depth of field of the optics. An illumination source and viewing optics provide a magnified view of images of both the mask and the substrate superimposed and in focus, thereby facilitating alignment of the substrate with respect to the mask prior to photolithographic printing. This apparatus may also be employed to measure the degree of surface flatness and parallelism between the mask and the substrate and the dimensions of surface features.
REFERENCES:
patent: 2552238 (1951-05-01), Turner
patent: 3191490 (1965-06-01), Rabinow
patent: 3709579 (1973-01-01), Makosch
patent: 3896304 (1975-07-01), Aoki et al.
patent: 3901597 (1975-08-01), White
patent: 3974327 (1976-08-01), Van Dijk
patent: 4070116 (1978-01-01), Frosch et al.
patent: 4127777 (1978-11-01), Binder
patent: 4133606 (1979-01-01), Hosoe et al.
patent: 4140392 (1979-02-01), Lacombat et al.
patent: 4200393 (1980-04-01), Suzuki et al.
patent: 4243848 (1981-01-01), Utsumi
patent: 4247203 (1981-01-01), Levy et al.
patent: 4329577 (1982-05-01), Asano et al.
patent: 4354103 (1982-10-01), Immink et al.
Allen David L.
Larsen Tor G.
Eaton Corporation
Griffin Roland I.
Rosenberger R. A.
LandOfFree
Auto-focus alignment and measurement system and method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Auto-focus alignment and measurement system and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Auto-focus alignment and measurement system and method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-640728