Auger microlithography with regard to Auger window

Radiation imagery chemistry: process – composition – or product th – Silver halide colloid tanning process – composition – or product

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430139, 430296, 430394, 430495, 430604, 430570, 430942, 430967, 2504921, 2504922, G03C 504, G03C 100, G03C 102, G03C 524

Patent

active

044254237

ABSTRACT:
An Auger microlithography process wherein a beam of substantially monochromatic X-rays is passed through a photomask to induce Auger electrons from a selected atomic element within a photosensitive layer which Auger electrons act on a material in that layer to cause a physicochemical change thereof and form a latent image. The X-rays used are selected to be substantially monochromatic such that the range of wave lengths falls largely or almost totally within the Auger window, as defined, determined by the particular electron shell of the atomic element to be activated to produce the Auger electrons.

REFERENCES:
patent: 3282697 (1966-11-01), Blank et al.
patent: 3960560 (1976-06-01), Sato
patent: 3963497 (1976-06-01), Kosti
patent: 3966473 (1976-06-01), Sato
patent: 4056395 (1977-11-01), Sato et al.
patent: 4113486 (1978-09-01), Sato
patent: 4119855 (1978-10-01), Bernacki
patent: 4177071 (1979-12-01), Brabardere et al.
patent: 4246328 (1981-01-01), Sato et al.
patent: 4260670 (1981-04-01), Burns
patent: 4350755 (1982-09-01), Wang

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Auger microlithography with regard to Auger window does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Auger microlithography with regard to Auger window, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Auger microlithography with regard to Auger window will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-453837

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.