Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1995-04-17
1996-04-02
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430314, 430322, 430323, 430324, G03F 900
Patent
active
055039510
ABSTRACT:
An attenuating, phase-shift, semiconductor fabrication mask having recessed attenuating and phase-shifting regions that is not susceptible to phase defects in the printing regions of the mask. This desirable result is accomplished by not altering the surface of the fully transmissive regions of the mask and by recessing the attenuating regions of the mask relative to the fully transmissive regions.
A method of forming the recessed attenuated phase-shift mask is also included. The process begins by forming recesses in the regions of the mask substrate where phase-shifting is desired and back filling these recessed regions with a selected thickness of attenuating material so that the attenuation effect of the deposited material together with the depth of the recess co-act to shift the light approximately 180.degree. (.pi. radians) from the light transmitted through the adjacent transmissive regions of the mask to create by destructive interference a sharp delineation at the edges of the projected mask image.
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Burn J. Lin "The Attenuated Phase-Shift Mask" Jan., 1992 Sold State Technology pp. 41-47.
Levenson et al., "Improving Resolution in Photolithography with a Phase-Shifting Mask," Dec. 1982, IEEE Transactions on Electron Devices, vol. Ed-29, No. 12, pp. 18-36.
Todokoro et al., "Self-Aligned Phase Shifting Mask for Contact Hole Fabrication," 1991, Microelectronic Engineering, No. 13, pp. 131-134.
Ishiwata et al., "Fabrication of Phase-Shifting Mask," 1991, Proceedings of the SPIE, vol. 1463, pp. 423-433.
Flanders Steven D.
O'Grady David S.
International Business Machines Corp.
Meier Lawrence
Rosasco S.
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