Attenuating phase shift mask blank and photomask

Details Attenuating phase shift mask blank and photomask Attenuating phase shift mask blank and photomask

2006-04-18

2006-04-18

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07029803

ABSTRACT:
The present invention relates to attenuating phase shift mask blanks for use in lithography, a method of fabricating such a mask blank.

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patent: 2002/0122991 (2002-09-01), Shiota et al.
patent: 04068352 (1992-03-01), None
Burn J. Lin, “The Attenuated Phase-Shifting Mask”, Solid State Technology, Jan. issue, pp. 43-47, (1992).

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