Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1997-02-10
1999-04-27
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
428433, G03F 900
Patent
active
058979778
ABSTRACT:
Attenuating embedded phase shift photomask blanks capable of producing a 180.degree. phase shift with an optical transmissivity of at least 0.0001 at wavelengths <400 nm comprise alternating layers, either periodic or aperiodic, of an optically transmissive material and an optically absorbing material and are made by depositing alternating layers of optically transmissive material and optically absorbing material on a substrate, preferably by vapor deopsition.
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Mileham, J.R. et al., Wet chemical etching of AIN, Appl. Phys. Lett., 67(8), 1119-1121, Aug. 1995.
Kalk, F.D. et al. Attenuated phase-shifting photomasks fabricated from Cr-based embedded shifter blanks, Photomask and X-Ray Mask Technology, SPIE vol. 2254, 64-70, Apr. 1994.
Shul, R.J. et al., High rate electron cyclotron resonance etching of GaN, InN, and AIN, Journal of Vacuum Science Technology, B13(5), 2016-2021, Sep./Oct. 1995.
Carcia, P.F., Evolution of Metal Multilayers For MO Recording, Proceeding of Magneto-Optical Recording International Symposium '94, Magn. Soc. Jpn., vol. 19, 5-16 Mar. 1994.
P.F. Carcia et al., Materials screening for attenuating embedded phase-shift photoblanks for DUV and 193 nm photolithography, Proceedings of 16th Annual Symposium on Photomask Technology and Management, 2884, 255-263, Sep. 1996.
Carcia Peter Francis
French Roger Harquail
E. I. Du Pont de Nemours and Company
Rosasco S.
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