Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1997-02-10
1999-04-27
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
G06F 900
Patent
active
058979760
ABSTRACT:
Attenuating embedded phase shift photomask blanks capable of producing a phase shift of 180.degree. and having an optical transmissivity of at least 0.001 at selected lithographic wavelengths <400 nm comprise at least one layer of an aluminum compound and at least one component that is more optically absorbing than the aluminum compound at selected lithographic wavelengths <400 nm and are made by depositing at least one layer of an aluminum compound and at least one component that is more optically absorbing than the aluminum compound onto a substrate.
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Mileham, J.R. et al., Wet chemical etching of AIN, Appl. Phys. Lett., 67(8), 1119-1121, Aug. 1995.
Kalk, F.D. et al., Attenuated phase-shifting photomasks fabricated from Cr-based embedded shifter blanks, Photomasks and X-Ray Mask Technology, SPIE vol. 2254, 64-70, Apr. 1994.
M. Takekazu et al. (Dainippon Printing Co Ltd), Halftone Phase Shift Photomask and Blank For Halftone Phase Shift Photomask, Patent Abstracts of Japan, Publication No. 08272074, Oct. 18, 1996.
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Carcia Peter Francis
French Roger Harquail
E. I. Du Pont de Nemours and Company
Rosasco S.
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