Attenuated phase shift mask comprising phase shifting layer with

Details Attenuated phase shift mask comprising phase shifting layer with Attenuated phase shift mask comprising phase shifting layer with

1995-06-05

1997-02-11

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430313, 430322, 430324, G03F 900

Patent

active

056019548

ABSTRACT:
An attenuated phase shift mask comprises a first layer having a thickness to provide a transmission in the range of about 3 to 10% formed on a transparent substrate and a second layer comprising a transparent material having a thickness to provide a desired phase shift, formed on said first layer. For a phase shift of 180.degree. and i-line wavelength (365 nm), where chromium is used as the first layer, then a thickness within the range of about 25 to 75 run is employed; where silicon dioxide is used as the second layer, then a thickness of about 400 to 450 nm is employed. While the oxide may be dry-etched, an isotropic wet etch provides superior aerial images.

REFERENCES:
patent: 5286581 (1991-08-01), Lee
M. D. Levenson et al, "Improving Resolution in Photolithography with a Phase-Shifting Mask", IEEE Transactions on Electron Devices, vol. ED-29, No. 12, pp. 1828-1836 (Dec. 1982).
R. A. Ferguson et al, "Impact of Attenuated Mask Topography on Lithographic Performance", SPIE Meeting, Mar. 1994, paper No. 2197-12.
M. Nakajima et al, "Attenuated phase-shifting mask with a single-layer absorptive shifter of CrO, CrON, MoSiO and MoSiON flim", SPIE Meeting, Mar. 1994, paper No. 2197-10.
A. Wong et al, "Phase-Shifter Edge Effects on Attenuated Phase-Shifting Mask Image Quality", SPIE Meeting, Mar. 1994, paper No. 2197-11.

Affiliated with

Also associated with

Rating

Attenuated phase shift mask comprising phase shifting layer with does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Attenuated phase shift mask comprising phase shifting layer with, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Attenuated phase shift mask comprising phase shifting layer with will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-340797