Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2005-12-27
2005-12-27
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
06979518
ABSTRACT:
An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen and oxygen. An etch stop layer is added to improve the etch selectivity of the phase shifting layer. A wide range of optical transmission (0.001% up to 15% at 157 nm) is obtained by this process.
REFERENCES:
patent: 6309780 (2001-10-01), Smith
patent: 6395433 (2002-05-01), Smith
Burn, J. Lin, “The Attenuated Phase-Shifting Mask”, Solid State Technology, Jan. 1992, pp. 43-47.
Liberman, V. et al., “Materials Issues For Optical Components And Photomasks In 157 NM Lithography”, J. Vac. Sci. Technol. B17, Nov./Dec. 1999, pp. 3273-3279.
Angelopoulos Marie
Babich Katherina
Chey S. Jay
Hibbs Michael Straight
Lang Robert N.
Morris, Esq. Daniel P.
Rosasco S.
Scully Scott Murphy & Presser
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