Stock material or miscellaneous articles – Display in frame or transparent casing; or diorama including... – Peripheral enclosure or frame
Reexamination Certificate
2007-09-04
2007-09-04
Chen, Vivian (Department: 1773)
Stock material or miscellaneous articles
Display in frame or transparent casing; or diorama including...
Peripheral enclosure or frame
C428S034000, C428S212000, C156S306600, C156S308200, C156S308400, C156S313000, C156S324400, C156S327000, C430S005000, C355S030000, C355S053000, C355S075000
Reexamination Certificate
active
10649354
ABSTRACT:
A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may be used in a lithography system. The pellicle allows radiation to pass through the pellicle to the reticle and may prevent particles from passing through the pellicle.
REFERENCES:
patent: 4060654 (1977-11-01), Quenneville
patent: 4737387 (1988-04-01), Yen
patent: 4743493 (1988-05-01), Sioshansi et al.
patent: 5041304 (1991-08-01), Kusano et al.
patent: 5378514 (1995-01-01), Hamada et al.
patent: 5643654 (1997-07-01), Fujita et al.
patent: 5693382 (1997-12-01), Hamada et al.
patent: 5723860 (1998-03-01), Hamada et al.
patent: 5880204 (1999-03-01), McCarthy et al.
patent: 5958524 (1999-09-01), Dehennau et al.
patent: 6055040 (2000-04-01), Sego
patent: 6083577 (2000-07-01), Nakagawa et al.
patent: 6111062 (2000-08-01), Shirota et al.
patent: 6300019 (2001-10-01), Ikeda et al.
patent: 6436586 (2002-08-01), Matsuoka et al.
patent: 6459491 (2002-10-01), Nguyen
patent: 6524754 (2003-02-01), Eynon
patent: 6548129 (2003-04-01), Matsukura et al.
patent: 6639650 (2003-10-01), Shirasaki
patent: 6652958 (2003-11-01), Tobita
patent: 6822731 (2004-11-01), Laganza et al.
patent: 6841312 (2005-01-01), Kalk
patent: 6842227 (2005-01-01), Shu
patent: 6842228 (2005-01-01), Shu
patent: 6869733 (2005-03-01), Su
patent: 2001/0004508 (2001-06-01), Shirasaki
patent: 2001/0014375 (2001-08-01), Tanaka
patent: 2002/0136965 (2002-09-01), Tsumoto et al.
patent: 2002/0179852 (2002-12-01), Zheng et al.
patent: 2003/0096178 (2003-05-01), Fujita et al.
patent: 2003/0187168 (2003-10-01), Sunaga et al.
patent: 2003/0192567 (2003-10-01), Koizumi et al.
patent: 2004/0123950 (2004-07-01), Boyd
patent: 2005/0048376 (2005-03-01), Eschbach et al.
patent: 2005/0202252 (2005-09-01), Tregub et al.
patent: 2005/0203254 (2005-09-01), Tregub et al.
patent: 0 252 673 (1988-01-01), None
patent: 0 416 528 (1991-03-01), None
patent: 0 438 602 (1991-07-01), None
patent: 0 529 827 (1993-03-01), None
patent: 0 942 325 (1999-09-01), None
patent: 09-005982 (1997-01-01), None
Shu et al.; “Hard Pellicle Study for 157-nm Lithography,” Preprint, to appear in the Proceedings of Photomask Japan, 2002.
Radiation Physics and Chemistry 62 (2001) 39-45; Oshioma et al.; “Chemical structure and physical properties of radiation-induced crosslinking of polytetrafluoroethylene”; www.elsevier.com/locate/radphyschem; © 2001 Elsevier Science Ltd.
Reu et al.; “Mechanical analysis of hard pellicles for 157 nm lithography”; to appear in the Proceedings of the 2001 SPIE Symposium on Optical Microlithography XIV, vol. 4346, 2001.
Kozeki et al.; “Longevity of 193nm/ArF Excimer Pellicle”; Apr. 26, 2001; Mitsui Chemicals, Inc., Pellicles Dept.
D.W. Van Krevelen, with collaboration of P.J. Hoftyzer; “Properties of Polymers, Their Estimation and Correlation with Chemical Structure,” Second, completely revised edition, pp. 68-73; Elsevier Scientific Publishing Company, Amsterdam-Oxford-New York 1976.
Chen, et al., “Pellicle-Induced Reticle Distortion: An Experimental Investigation”,Proc. of SPIE—The Int'l Soc. for Optical Engineering, vol. 3546, pp. 167-172 (1998).
Cotte, et al., “Effects of Soft Pellicle Frame Curvature and Mounting Process on Pellicle-Induced Distortions in Advanced Photomasks”,Proc. of SPIE—The Int'l Soc. for Optical Engineering, vol. 5040, pp. 1044-1054 (2003).
Cotte, et al., “Experimental and Numerical Studies of the Effects of Materials and Attachement Conditions on Pellicle-Induced Distortions in Advanced Photomasks”,Proc. of SPIE—The Int'l Soc. for Optical Engineering, vol. 4754, pp. 579-588 (2002).
Cotte, et al., “Numerical and Experimental Studies of Pellicle-Induced Photomask Distortions”,Proc. of SPIE—The Int'l Soc. for Optical Engineering, vol. 4562, pp. 641-651 (2002).
Karis, et al., “Characterization of a solid fluorocarbon film on magnetic recording media”,J. Vac. Sci. Technol. A, 15(4):2382-2387, (1997).
Karis, et al., “Tribology of a Solid Flurocarbon Film on Magnetic Recording Media”,IEEE Transactions on Magnetics, 34(4):1747-1749, (1998).
LaPedus, M., “Nikon evaluating 157-nm lithography options”,EE Times UK, http://www.eetuk.com/tech
ews/dev/ OEG20030523S0061, May 24, 2003.
Resnick & Buck, “Teflon® AF Amorphous Flouropolymers”,Modern Fluoropolymers, Edited by J. Schews, John Wiley & Sons, Inc., pp. 397-419, (1997).
Seki, et al., “Electronic Structure of Poly(tetrafluoroethylene) Studied by UPS, VUV Absorption, and Band Calculations”,Physica Scripta, 41(1):167-171, (1990).
Singer, P., “Atomic Layer Deposition Targets Thin Films”,Semiconductor International, 22(10):40, (1999).
Sugiyama, “Perfluoropolymers Obtained by Cyclopolymerization and Their Applications”,Modern Fluoropolymers, Edited by J. Schews, John Wiley & Sons, Inc., pp. 541-555, (1997).
Theirich, et al., “A novel technique for high rate plasma polymerization with radio frequency plasmas”,Surface and Coatings Technology, 86-87, pp. 628-633, (1996).
Walton, K.R., “The Lubrication of Gold Surfaces by Plasma-Deposited Thin Films of Fluorocarbon Polymer,”IEE Transactions on Components, Hybrids, and Manufacturing Technology, CHMT-3(2):297-304, (1980).
Allinger, Norman, et al.,Organic Chemistry, Worth Publishers, Inc., 1971, p. 674.
Hawley's Condensed Chemical Dictionary, 13thEd., Revised by Richard J. Lewis, Sr., John Wiley & Sons, Inc., New York, NY, 1997, p. 297.
Webster's II New Riverside University Dictionary, Houghton Mifflin Company, 1988, p. 310.
Eschbach Florence
Lo Fu-Chang
Tregub Alexander
Zimmerman Paul
Chen Vivian
Fish & Richardson P.C.
Intel Corporation
LandOfFree
Attaching a pellicle frame to a reticle does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Attaching a pellicle frame to a reticle, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Attaching a pellicle frame to a reticle will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3736155