ATR-FTIR metal surface cleanliness monitoring

Details ATR-FTIR metal surface cleanliness monitoring ATR-FTIR metal surface cleanliness monitoring

2005-06-21

2005-06-21

Coleman, W. David (Department: 2823)

Semiconductor device manufacturing: process

With measuring or testing

C438S016000, C356S237200, C356S369000

Reexamination Certificate

active

06908773

ABSTRACT:
Attenuated total reflectance (ATR)-Fourier transform infrared (FTIR) metal surface cleanliness monitoring is disclosed. A metal surface of a semiconductor die is impinged with an infrared (IR) beam, such as can be accomplished by using an ATR technique. The IR beam as reflected by the metal surface is measured. For instance, an interferogram of the reflected IR beam may be measured. A Fourier transform of the interferogram may also be performed, in accordance with an FTIR technique. To determine whether the metal surface is contaminated, the IR beam as reflected is compared to a reference sample. For example, the Fourier transform of the interferogram may be compared to the reference sample. If there is deviation by more than a threshold, the metal surface may be concluded as being contaminated.

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