Atomspheric plasma reaction method and apparatus therefor

Details Atomspheric plasma reaction method and apparatus therefor Atomspheric plasma reaction method and apparatus therefor

1990-12-07

1993-02-09

Walsh, Donald P.

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

With means applying electromagnetic wave energy or...

4221863, 118720, B01J 1908, B01J 1912, C23C 1422, C23C 1428

Patent

active

051851326

ABSTRACT:
This invention provides an atmospheric plasma reaction method characterized by introducing a mixed gas of rare gas and reactive gas into a reaction vessel having a dielectric-coated electrode wherein the surface of two or more electrodes located parallel therewith are provided with solid dielectrics, exciting said mixed gas with plasma at atmospheric pressure, then transporting the active species to the downstream of the plasma and treating the surface of a substrate.
This invention also provides an atmospheric plasma reaction apparatus.

REFERENCES:
patent: 3959104 (1976-05-01), Faips
patent: 4013532 (1977-03-01), Cormia et al.
patent: 4224897 (1980-09-01), Dugdale
patent: 4233109 (1980-11-01), Nishizawa
patent: 4365587 (1982-12-01), Hirose et al.
patent: 4642171 (1987-02-01), Sekine et al.
patent: 4992299 (1991-02-01), Hochberg

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