Atomic mask and method of patterning a substrate with the atomic

Details Atomic mask and method of patterning a substrate with the atomic Atomic mask and method of patterning a substrate with the atomic

1997-04-11

2000-08-08

Turner, Archene

Stock material or miscellaneous articles

Structurally defined web or sheet

Discontinuous or differential coating, impregnation or bond

428210, 428336, 428457, 219209, 219552, 219553, B32B 900

Patent

active

060999454

ABSTRACT:
There is provided a method of patterning a substrate with an atomic mask having a mask substrate and first atoms adsorbed on the mask substrate, the first atoms forming a mask pattern having a one-atomic thickness, including the steps, in sequence, of (a) depositing adatoms over a surface of a substrate to be patterned, the adatoms having low reactivity with second atoms of which the substrate is composed, and (b) placed the atomic mask close to the substrate in such a distance that the first atoms form a chemical bond with the adatoms, so that adatoms located nearest to the first atoms are desorbed out of the substrate to form a pattern on the substrate, the pattern being defined as an area where none of the adatoms exists. In accordance with the above mentioned method, it is possible to form a pattern on the sub-nanometer or nanometer order with high accuracy and in a short period of time, and it is also possible to repeatedly form the same pattern by using the atomic mask.

REFERENCES:
patent: 5252835 (1993-10-01), Lieber et al.
I-W. Lyo et al; Science 253; p. 173; 1991.
"Atomic Emission From a Gold Scanning-Tunneling-Microscope Tip" H.J. Mamin et al Physicaly Review Letters, vol. 65; No. 19, 1990; pp. 2418-2421.
"Nanostructure Fabrication by Scanning Tunneling Microscope" Baba et al Japanese Journal of Applied Physics, vol. 29, No. 12, 1990; pp. 2854-2857.

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