Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized
Reexamination Certificate
2004-01-27
2008-11-25
Kornakov, Mikhail (Department: 1792)
Coating processes
Coating by vapor, gas, or smoke
Mixture of vapors or gases utilized
C427S255280, C427S553000, C427S554000, C427S586000, C216S002000, C216S013000
Reexamination Certificate
active
07455884
ABSTRACT:
A method for atomic layer deposition providing a dispenser unit used to prevent mixing of a precursor gas and an input gas. From the dispenser unit a flow of the input gas is provided over a surface of the workpiece wherein a beam of the electromagnetic radiation is directed into the input gas in close proximity to the surface of the workpiece, but spaced a finite distance therefrom. The input gas is dissociated by the beam producing a high flux point of use generated reactive gas species that reacts with a surface reactant formed on the surface of the workpiece by a direct flow of the precursor gas flown from the dispensing unit. The surface reactant and reactive gas species react to form a desired monolayer of a material on the surface of the workpiece.
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Prasad et al., Prediction of Deposition Rates in Atomic Layer Deposition, Focus Center—New York, Ransselaer: Interconnections for Gigascale Integrarion, Rensselaeer Polytechnic Institute, Troy, NY, Department of Mathematics and Statistics, University of Maryland.
Dinsmore & Shohl LLP
Kornakov Mikhail
Micro)n Technology, Inc.
Smith Francis P
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