Atomic layer deposition using metal amidinates

Details Atomic layer deposition using metal amidinates Atomic layer deposition using metal amidinates

2009-07-01

2010-06-15

Gonzalez, Porfirio Nazario (Department: 1621)

Organic compounds -- part of the class 532-570 series

Organic compounds

Heavy metal containing

C556S001000, C556S051000, C556S118000, C556S137000, C534S015000, C427S255190, C427S255394

Reexamination Certificate

active

07737290

ABSTRACT:
Metal films are deposited with uniform thickness and excellent step coverage. Copper metal films were deposited on heated substrates by the reaction of alternating doses of copper(I) NN′-diispropylacetamidinate vapor and hydrogen gas. Cobalt metal films were deposited on heated substrates be the reaction of alternating doses of cobalt(II) bis(N,N′-diispropylacetamidinate) vapor and hydrogen gas. Nitrides and oxides of these metals can be formed by replacing the hydrogen with ammonia or water vapor, respectively. The films have very uniform thickness and excellent step coverage in narrow holes. Suitable applications include electrical interconnects in microelectronics and magnetoresistant layers in magnetic information storage devices.

REFERENCES:
patent: 5085731 (1992-02-01), Norman et al.
patent: 5098516 (1992-03-01), Norman et al.
patent: 5144049 (1992-09-01), Norman et al.
patent: 5204314 (1993-04-01), Kirlin et al.
patent: 5225561 (1993-07-01), Kirlin et al.
patent: 5235078 (1993-08-01), Pohl et al.
patent: 5280012 (1994-01-01), Kirlin et al.
patent: 5322712 (1994-06-01), Norman et al.
patent: 5362328 (1994-11-01), Gardiner et al.
patent: 5453494 (1995-09-01), Kirlin et al.
patent: 5502128 (1996-03-01), Flores et al.
patent: 5536323 (1996-07-01), Kirlin et al.
patent: 5711816 (1998-01-01), Kirlin et al.
patent: 5820664 (1998-10-01), Gardiner et al.
patent: 5834058 (1998-11-01), Wallbridge et al.
patent: 5919522 (1999-07-01), Baum et al.
patent: 5932363 (1999-08-01), Hu et al.
patent: 6110529 (2000-08-01), Gardiner et al.
patent: 6211090 (2001-04-01), Durlam et al.
patent: 6294836 (2001-09-01), Paranjpe et al.
patent: 6337148 (2002-01-01), Xu et al.
patent: 6417369 (2002-07-01), Xu et al.
patent: 6440202 (2002-08-01), Xu et al.
patent: 6444263 (2002-09-01), Paranjpe et al.
patent: 6639080 (2003-10-01), Xu et al.
patent: 6818783 (2004-11-01), Norman et al.
patent: 2002/0081381 (2002-06-01), DelaRosa et al.
patent: 2002/0132375 (2002-09-01), Doan et al.
patent: 2002/0173054 (2002-11-01), Kim
patent: 2004/0175502 (2004-09-01), Senzaki
patent: 2005/0042372 (2005-02-01), Denk et al.
patent: 2005/0214458 (2005-09-01), Meiere
patent: 2005/0281952 (2005-12-01), Xu et al.
patent: 2006/0062910 (2006-03-01), Meiere
patent: 2006/0177577 (2006-08-01), Thompson
patent: 2006/0193979 (2006-08-01), Meiere et al.
patent: 4039449 (1992-06-01), None
patent: 1 142 894 (2001-10-01), None
patent: 2295392 (1996-05-01), None
patent: 2295393 (1996-05-01), None
patent: 200269088 (1990-11-01), None
patent: WO-91/08322 (1991-06-01), None
patent: WO-01/68948 (2001-09-01), None
patent: WO-2004/046417 (2004-06-01), None
Barker et al., “The Coordination Chemistry of the Amidine Ligand”, Coordination Reviews, vol. 133, pp. 219-300, 1994.
Barker, j. et al., N,N-Unsubstituted amidinato metallacycle complexes of Group 13 metal alkyls: the crystal structure of trimeric [{Me2AI(υ-HNCPhNH))3], Journal of Organometallic Chemistry, vol. 586, pp. 138-144, 1999.
Berno et al. “Dinitrogen Fixation versus Metal-Metal Bond Formation int he Chemistry of Vanadium (II) Amidinates”J. Am. Chem. Soc.1994, 116 (7417-7418).
Booyong, S. et al., “Atomic Layer Deposition of Transition of Metals”, Nature Publishing Group, Department of Chemistry and Chemical Biology, Harvard University, pp. 749-754, 2003.
Booyong, S. et al., “Synthesis and Characterization of Volatile, Thermally Stable, Reactive Transition Metal Amidinates”, Inorganiz Chemistry, vol. 42, No. 24, pp. 7951-7958, 2003.
Cole, M., et al., “The Synthesis of a Sterically Hindered Samarium(II) bis(amidinate) and conversion to its homoleptic trivalent congener,” Chemical Communications, 2005, pp. 2695-2697.
Coles, M.P. et al., “Synthesis and Structures of Mono- and Bis(amidinate) Complexes of Aluminum,” Organometallics, vol. 16, 1997, pp. 5183-5194.
Cotton, F. A., et al., J. Am. Chem. Soc., vol. 110, pp. 7077-7083, 1988.
Dias, H. V. Rasika et al., “Coinage Metal Complexes of 3,5-bis(trifluoromethyl)pyrazolate Ligand: Synthesis and Characterization of {[3,5-(CF3)2Pz]Cu}3 and {3,5(CF3)2Pz]3”, Journal of Fluorine Chemistry 2000, vol. 103, pp. 163-169.
Edelmann, “N-Silylated Benzamidines: Versatile Building Blocks in Main Group and Coordination Chemistry”, vol. 137, pp. 403-481, (1994).
Fix, et al., “Chemical Vapor Deposition of Titanium, Zirconium, and Hafnium Nitride Thin Films” , American Chemical Society, vol. 3(6), pp. 1138-1148, 1991.
Hao et al, “Ligand Steric Bulk: A Neglected Favor in the Formation of Cr-Cr Sypershort Contacts”, Inorganica Chimica Acta, vol. 213, pp. 65-74, (1996).
Hao et al. “The role of ligand steric hindrance in determining the stability of very short V-V contacts. Preparation and characterization of a series of V(II) and V(III) amidinates”Inorganica Chimica Act244 (1996) 37-49.
International Search Report from PCT/US2007/014768, mailed Nov. 11, 2007, 4 pages.
International Search Report from the European Patent Office for PCT/US03/36568, mailing date Jan. 17, 2005, 7 pages.
Kilner, M. et al., Polyhedron, vol. 2, No. 12, pp. 1379-1388, 1983.
Li, Z. et al., Synthesis and Characterization of Copper(I) Amidinates as Precursors for Atomic Layer Deposition (ALD) of Copper Metal,Inorganic Chemistry, vol. 44, pp. 1728-1735, 2005.
Lim et al. “Synthesis and Characterization of Volatile, Thermally Stable, Reactive Transition Metal Amidinates”Inorganic Chemistriy2003, 42 (7951-7958).
Lim, B. et al., “Atomic layer deposition of transition metals”, Nature Materials, vol. 2, pp. 749-754, Nov. 2003.
Martensson, P. et al., “Atomic Layer Epitaxy of Copper”, J. Electrochem. Soc., vol. 145, pp. 2926-2931, Aug. 1998.
Official Action issued by the European Patent Office on Jan. 25, 2006 in connection with European Patent Application No. 03 783.541.0.
Sadique et al., “Monomeric and Dimeric Amidinate Complexes of Magnesium”, Inorg. Chem., vol. 40, pp. 6349-6355, 2001.
Sadique, AR et al., “A Weak, Short Metal-Metal Bond in a Chromium (II) Amidinate Complex”, J. Am. Chem. Soc., vol. 125, pp. 7774-7775, 2003.
Schmidt, J. A.R. et al., “First-row transition metal complexes of sterically-hindered amidinates”, J. Chem. Soc., Dalton Trans., pp. 3454-3461, 2002.
Shibayama, K. et al., “Living Polymerization of Carbodiimides Initiated by Copper(I) and Copper (II) Amidinate Complexes” Macromolecules, vol. 30, pp. 3159-3163, 1997.
Vendemiati et al., “Paramagnetic Bis(amidinate) Iron (II) Complexes and their Diamagnetic Dicarbonyl Derivatives”, Eur. J. Inorg. Chem., pp. 707-711, 2001.
Zhengwen, L. et al., “Synthesis and Characterization of Copper(I) Amidinates as Precursors for Atomic Layer Deposition (ALD) of Copper Metal”, Inorganic Chemistry, vol. 44, No. 6, pp. 1728-1735, 2005.

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