Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized
Reexamination Certificate
2011-04-12
2011-04-12
Talbot, Brian K (Department: 1715)
Coating processes
Coating by vapor, gas, or smoke
Mixture of vapors or gases utilized
C427S255280, C427S576000
Reexamination Certificate
active
07923070
ABSTRACT:
This invention includes atomic layer deposition methods of forming conductive metal nitride comprising layers. In one implementation, an atomic layer deposition method of forming a conductive metal nitride comprising layer includes positioning a substrate within a deposition chamber. A first species is chemisorbed to form a first species monolayer onto the substrate from a gaseous first precursor comprising at least one of an amido metal organic compound or an imido metal organic compound. The first species monolayer comprises organic groups. The chemisorbed first species is contacted with a second precursor plasma effective to react with the first species monolayer to remove organic groups from the first species monolayer. The chemisorbing and contacting are successively repeated under conditions effective to form a layer of material on the substrate comprising a conductive metal nitride.
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Kraus Brenda D.
Marsh Eugene P.
Micro)n Technology, Inc.
Talbot Brian K
Wells St. John P.S.
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