Atomic force microscopy measurements of contact resistance...

Details Atomic force microscopy measurements of contact resistance... Atomic force microscopy measurements of contact resistance...

2006-01-03

2006-01-03

Raevis, Robert (Department: 2856)

Measuring and testing

Coating material: ink adhesive and/or plastic

C073S105000

Reexamination Certificate

active

06981407

ABSTRACT:
A modified atomic force microscope (AFM) is used to perform contact resistance and/or current-dependent stiction measurements for conductive thin films at controlled values of applied force. The measurements are preferably performed under conditions approximating the operation of the thin films as electrodes in microswitch array fingerprint sensors. A first, planar thin film is contacted with a second, curved thin film deposited over a round ball having a diameter of a few microns to a few tens of microns. The second film is preferably a coating deposited over the ball and over the arm controlling the ball motion. The coating deposited over the arm provides an electrically conductive path to the contact surface of the ball.

REFERENCES:
patent: 5585734 (1996-12-01), Meuris et al.
patent: 5723981 (1998-03-01), Hellemans et al.
patent: 5747120 (1998-05-01), McLean et al.
patent: 5763768 (1998-06-01), Henderson et al.
patent: 5900738 (1999-05-01), Khandros et al.
patent: 5992266 (1999-11-01), Heim
patent: 5995912 (1999-11-01), DeWolf et al.
patent: 6185992 (2001-02-01), Daniels et al.
patent: 6496023 (2002-12-01), Khandros et al.
patent: 6640433 (2003-11-01), Kuroda et al.
patent: 6646455 (2003-11-01), Maekawa et al.
De Wolf, et al. “Lateral and vertical dopant profiling in semiconductors by atomic force microscopy using conducting tops” (J. Vac. Sci. Tech. A 13(3), May/Jun. 1995, pp. 1699-1704.

Affiliated with

Also associated with

Rating

Atomic force microscopy measurements of contact resistance... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Atomic force microscopy measurements of contact resistance..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Atomic force microscopy measurements of contact resistance... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3536458