Atom lithographic mask having diffraction grating and attenuated

Details Atom lithographic mask having diffraction grating and attenuated Atom lithographic mask having diffraction grating and attenuated

1997-04-01

1998-12-22

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

058517014

ABSTRACT:
An ATOM lithographic mask includes a transparent substrate having a pattern of attenuated phase shifters and a diffraction grating aligned with the attenuated phase shifters. The attenuated phase shifters form the primary mask pattern, while the diffraction grating diffracts exposure energy directed through the mask to provide off axis illumination for the attenuated phase shifters. The diffraction grating includes chromeless phase shifters formed using an additive or subtractive process. Both the attenuated phase shifters and diffraction grating can be formed as simple line-space patterns or in other patterns as required. In an alternate embodiment the diffraction grating is formed on a separate mask.

REFERENCES:
patent: 4326805 (1982-04-01), Feldman et al.
patent: 5240796 (1993-08-01), Lee et al.
patent: 5447810 (1995-09-01), Chen et al.
patent: 5480747 (1996-01-01), Vasudev
patent: 5587834 (1996-12-01), Noguchi et al.
patent: 5624773 (1997-04-01), Pforr et al.
Luehrmann, Paul et al., "0.35 .mu.m Lithography Using Off-Axis Illumination", Technical Paper, SPIE--Optical/Laser Microlithography VI Conference, San Jose, California, Mar., 1993.
Kang, Ho-Young, et al. A new Method of Tilted Illumination using Grating Mask;ATOM (Advanced Tilted illumination On Mask), SPIE vol. 1927 Optical Laser Microlithography VI Mar. 1993) p. 226.

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