Atom collimator

Coating apparatus – Gas or vapor deposition – With treating means

Patent

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Details

118715, 118720, 250251, C23C 1400

Patent

active

053761790

ABSTRACT:
An atom collimator having a square configuration and a curved surface. Thanking for the square configuration, the collimator of this present is prevented from its location above a contact hole of a semiconductor substrate. Either of upper and lower surfaces of the collimator is curved to become a concavity or convexity with a radius of curvature. This collimator is not placed over a contact hole during deposition of a contact of a semiconductor device and has the curved surface with the radius of curvature, thus to cause the atoms to be received by the contact hole of a semiconductor substrate as vertically as possible and to improve the step coverage of the semiconductor device.

REFERENCES:
patent: 4800840 (1989-01-01), Colton
patent: 4834021 (1989-05-01), Opresko
patent: 5236510 (1993-08-01), Brennesholtz

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