Coating apparatus – Gas or vapor deposition – With treating means
Patent
1993-12-28
1994-12-27
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
118715, 118720, 250251, C23C 1400
Patent
active
053761790
ABSTRACT:
An atom collimator having a square configuration and a curved surface. Thanking for the square configuration, the collimator of this present is prevented from its location above a contact hole of a semiconductor substrate. Either of upper and lower surfaces of the collimator is curved to become a concavity or convexity with a radius of curvature. This collimator is not placed over a contact hole during deposition of a contact of a semiconductor device and has the curved surface with the radius of curvature, thus to cause the atoms to be received by the contact hole of a semiconductor substrate as vertically as possible and to improve the step coverage of the semiconductor device.
REFERENCES:
patent: 4800840 (1989-01-01), Colton
patent: 4834021 (1989-05-01), Opresko
patent: 5236510 (1993-08-01), Brennesholtz
Bueker Richard
Hyundai Electronics Industries Co,. Ltd.
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