Cleaning and liquid contact with solids – Processes – Hollow work – internal surface treatment
Reexamination Certificate
2006-03-28
2006-03-28
Kornakov, M. (Department: 1746)
Cleaning and liquid contact with solids
Processes
Hollow work, internal surface treatment
C134S001100, C134S021000, C134S025100, C134S025400, C134S034000, C134S042000, C422S186040, C422S186060, C422S186210, C422S186290, C422S186180, C156S345430, C156S345440, C156S345480
Reexamination Certificate
active
07017594
ABSTRACT:
The present invention relates to methods and apparatuses for the use of atmospheric pressure non-thermal plasma to clean and sterilize the surfaces of liquid handling devices.
REFERENCES:
patent: 5200158 (1993-04-01), Jacob
patent: 5225659 (1993-07-01), Kusano et al.
patent: 5236672 (1993-08-01), Nunez et al.
patent: 5262125 (1993-11-01), Goodman
patent: 5414324 (1995-05-01), Roth et al.
patent: 5451428 (1995-09-01), Rupp
patent: 5573732 (1996-11-01), Waggener et al.
patent: 5633424 (1997-05-01), Graves et al.
patent: 5686789 (1997-11-01), Schoenbach et al.
patent: 5700327 (1997-12-01), Babacz et al.
patent: 5741460 (1998-04-01), Jacob et al.
patent: 5876663 (1999-03-01), Laroussi
patent: 5895558 (1999-04-01), Spence
patent: 5897831 (1999-04-01), Jacob et al.
patent: 5935339 (1999-08-01), Henderson et al.
patent: 5939829 (1999-08-01), Schoenbach et al.
patent: 5965093 (1999-10-01), Adams
patent: 6059935 (2000-05-01), Spence
patent: 6072273 (2000-06-01), Schoenbach et al.
patent: 6105589 (2000-08-01), Vane
patent: 6174500 (2001-01-01), Uno et al.
patent: 6204605 (2001-03-01), Laroussi et al.
patent: 6342187 (2002-01-01), Jacob et al.
patent: 6346770 (2002-02-01), Schoenbach et al.
patent: 6403029 (2002-06-01), Schmidt
patent: 6482369 (2002-11-01), Wang
patent: 6518692 (2003-02-01), Schoenbach et al.
patent: 6528022 (2003-03-01), Kinoshita
patent: 6610257 (2003-08-01), Vane
patent: 6624413 (2003-09-01), Klein
patent: 6645441 (2003-11-01), Andrews et al.
patent: 6652816 (2003-11-01), Hwang
patent: 6667007 (2003-12-01), Schmidt
patent: 6692704 (2004-02-01), Nelson et al.
patent: 6724608 (2004-04-01), Hensley et al.
patent: 6784424 (2004-08-01), Willoughby et al.
patent: 2001/0031234 (2001-10-01), Christodoulatos et al.
patent: 2002/0020691 (2002-02-01), Jewett et al.
patent: 2002/0036461 (2002-03-01), Schoenbach et al.
patent: 2002/0076369 (2002-06-01), Hwang
patent: 2002/0076370 (2002-06-01), Wong et al.
patent: 2002/0153241 (2002-10-01), Niv et al.
patent: 2002/0195950 (2002-12-01), Mikhael et al.
patent: 2003/0015415 (2003-01-01), Platt, Jr. et al.
patent: 2003/0052096 (2003-03-01), Crowe et al.
patent: 2003/0072675 (2003-04-01), Takeda et al.
patent: 2003/0098230 (2003-05-01), Carlow et al.
patent: 2003/0106788 (2003-06-01), Babko-Malyi
patent: 2003/0116541 (2003-06-01), Chiou et al.
patent: 2003/0129107 (2003-07-01), Denes et al.
patent: 2003/0132100 (2003-07-01), Crowe et al.
patent: 2003/0155332 (2003-08-01), Datta et al.
patent: 2004/0011764 (2004-01-01), DeVries et al.
patent: 2004/0022945 (2004-02-01), Goodwin et al.
patent: 2004/0037756 (2004-02-01), Houston, Jr. et al.
patent: 2004/0045806 (2004-03-01), Neff et al.
patent: 2004/0050685 (2004-03-01), Yara et al.
patent: 2004/0052028 (2004-03-01), O'Reilly et al.
patent: 2004/0112537 (2004-06-01), Yamazaki et al.
patent: 2004/0134890 (2004-07-01), Uhm et al.
patent: 2004/0148860 (2004-08-01), Fletcher
patent: 2004/0185396 (2004-09-01), Rosocha et al.
patent: 2004/0195088 (2004-10-01), Rostaing et al.
patent: 2004/0231926 (2004-11-01), Sakhrani et al.
patent: 2004/0238124 (2004-12-01), Nakamura
patent: 0 798 397 (1997-10-01), None
Merriam-Webster's Collegiate Dictionary, Tenth Edition, 1999. p. 1270.
U. Kogelschatz, “Dielectric-Barrier Discharges: Their History, Discharge Physics and Industrial Applications,” Plasma Chemistry and Plasma Processing, vol. 23, No. 1, Mar. 2003.
U. Kogelschatz, “Filamentary, Patterned and Diffuse Barrier Discharges,” IEEE Transactions on Plasma Science, vol. 30, No. 4, Aug. 2002.
N. St. J. Braithwaite, “Introduction to Gas Discharges” Plasma Sources Science and Technology, vol. 9, 2000, p517-527.
U. Kogelschatz et al. “Dielectric-Barrier Discharges, Principles and Applications” J. Phys IV France, 7, 1997, C4-47.
E. M. Van Veldhuizen, W.R. Rutgers, “Corona Discharges: Fundamentals and Diagnostics” Invited Paper, Proceedings of Frontiers in Low Temperature Plasma Diagnostics IV, Rolduc, The Netherlands, Mar. 2001, pp. 40-49.
Publication ANSI/SBS 4-2004, “Well Positions for Microplates,” Jan. 2004, The Society for Biomolecular Screening, www.sbsonline.com.
H. Conrads et al., “Plasma Generation and Plasma Sources” Plasma Sources Science and Technology, vol. 9, 2000, p441-454.
Cerionx, Inc.
Kornakov M.
Moser IP Law Group
LandOfFree
Atmospheric pressure non-thermal plasma device to clean and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Atmospheric pressure non-thermal plasma device to clean and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Atmospheric pressure non-thermal plasma device to clean and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3606965