Electric heating – Metal heating – By arc
Patent
1996-06-18
1997-12-02
Pascal, Robert
Electric heating
Metal heating
By arc
21912119, 216 66, 216 67, 31511181, B23K 1500
Patent
active
056932413
ABSTRACT:
A gas stream containing ionic and atomic oxygen in inert gas is used to remove organic matter from a substrate. The gas stream is formed by flowing a mixture of gaseous oxygen in an inert gas such as helium at atmospheric pressure past a high voltage, current limited, direct current arc which contacts the gas mixture and forms the ionic and atomic oxygen. The arc is curved at the cathode end and the ionic oxygen formed by the arc nearer to the anode end of the arc is accelerated in a direction towards the cathode by virtue of its charge. The relatively high mass to charge ratio of the ionic oxygen enables at least some of it to escape the arc before contacting the cathode and it is directed onto the substrate. This is useful for cleaning delicate substrates such as fine and historically important paintings and delicate equipment and the like.
REFERENCES:
patent: 4548033 (1985-10-01), Cann
patent: 4609445 (1986-09-01), Collins
patent: 4995805 (1991-02-01), Hilliard
patent: 5009743 (1991-04-01), Swann
patent: 5147465 (1992-09-01), Maruyama et al.
patent: 5194118 (1993-03-01), Shinohara
patent: 5344526 (1994-09-01), Nishibayashi et al.
patent: 5369336 (1994-11-01), Koinuma et al.
patent: 5391855 (1995-02-01), Tanisaki
patent: 5417798 (1995-05-01), Nishibayashi et al.
patent: 5518595 (1996-05-01), Yamakage
patent: 5554257 (1996-09-01), Yokogawa et al.
patent: 5597495 (1997-01-01), Keil et al.
Banks Bruce A.
Rutledge Sharon K.
Pascal Robert
Philogene Haissa
Stone Kent N.
The United States of America as represented by the Administrator
LandOfFree
Atmospheric pressure method and apparatus for removal of organic does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Atmospheric pressure method and apparatus for removal of organic, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Atmospheric pressure method and apparatus for removal of organic will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-798539