Atmospheric pressure method and apparatus for removal of organic

Electric heating – Metal heating – By arc

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

21912119, 216 66, 216 67, 31511181, B23K 1500

Patent

active

056932413

ABSTRACT:
A gas stream containing ionic and atomic oxygen in inert gas is used to remove organic matter from a substrate. The gas stream is formed by flowing a mixture of gaseous oxygen in an inert gas such as helium at atmospheric pressure past a high voltage, current limited, direct current arc which contacts the gas mixture and forms the ionic and atomic oxygen. The arc is curved at the cathode end and the ionic oxygen formed by the arc nearer to the anode end of the arc is accelerated in a direction towards the cathode by virtue of its charge. The relatively high mass to charge ratio of the ionic oxygen enables at least some of it to escape the arc before contacting the cathode and it is directed onto the substrate. This is useful for cleaning delicate substrates such as fine and historically important paintings and delicate equipment and the like.

REFERENCES:
patent: 4548033 (1985-10-01), Cann
patent: 4609445 (1986-09-01), Collins
patent: 4995805 (1991-02-01), Hilliard
patent: 5009743 (1991-04-01), Swann
patent: 5147465 (1992-09-01), Maruyama et al.
patent: 5194118 (1993-03-01), Shinohara
patent: 5344526 (1994-09-01), Nishibayashi et al.
patent: 5369336 (1994-11-01), Koinuma et al.
patent: 5391855 (1995-02-01), Tanisaki
patent: 5417798 (1995-05-01), Nishibayashi et al.
patent: 5518595 (1996-05-01), Yamakage
patent: 5554257 (1996-09-01), Yokogawa et al.
patent: 5597495 (1997-01-01), Keil et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Atmospheric pressure method and apparatus for removal of organic does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Atmospheric pressure method and apparatus for removal of organic, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Atmospheric pressure method and apparatus for removal of organic will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-798539

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.