Atmospheric pressure glow discharge treatment of paper base mate

Details Atmospheric pressure glow discharge treatment of paper base mate Atmospheric pressure glow discharge treatment of paper base mate

1997-05-19

1999-03-30

Huff, Mark F.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Identified backing or protective layer containing

430531, 430937, 204164, 204165, 42218605, 422907, 427562, G03C 179

Patent

active

058887130

ABSTRACT:
The present invention is a method of producing a photographic support. The method includes providing a photographic paper and transporting the photographic paper through an atmospheric glow discharge zone, wherein the atmospheric glow discharge zone contains a gas with a dielectric strength which is less than air. The atmospheric glow discharge zone is subjected to an electric frequency between 40 kHz and 13.56 Mhz and an electric field such that an atmospheric glow discharge is formed; and the photographic paper is coated with a polymeric coating.

REFERENCES:
patent: 3411908 (1968-11-01), Crawford et al.
patent: 4147836 (1979-04-01), Middleton et al.
patent: 4220471 (1980-09-01), Date et al.
patent: 4476153 (1984-10-01), Kiritani et al.
patent: 5316739 (1994-05-01), Yoshikawa et al.
patent: 5403453 (1995-04-01), Roth et al.
patent: 5414324 (1995-05-01), Roth et al.
patent: 5456972 (1995-10-01), Roth et al.
patent: 5466333 (1995-11-01), Guttag
patent: 5714308 (1998-02-01), Romach et al.

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