Atmospheric pressure glow discharge treatment of base material f

Details Atmospheric pressure glow discharge treatment of base material f Atmospheric pressure glow discharge treatment of base material f

1996-07-23

1998-08-04

Letscher, Geraldine

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Identified backing or protective layer containing

430523, 430524, 430530, 430531, 430532, 430631, 430935, 430950, 430961, G03C 185

Patent

active

057891451

ABSTRACT:
The present invention is a method for treating a polyester support such as polyethylene naphthalate or polyethylene terephthalate. The treatment is carried out at atmospheric pressure in a gas of helium and optionally nitrogen and/or oxygen. The treatment uses metallic electrodes and an atmospheric glow discharge results when the electrodes are connected to a generator and spaced about 1 to 2 mm apart. The process and apparatus improve adhesion of subsequently coated emulsions on the polyester support at high speeds and relatively low power by selecting a frequency of 40 kHz to 500 kHz.

REFERENCES:
patent: 3411908 (1968-11-01), Crawford et al.
patent: 3531314 (1970-09-01), Kerr et al.
patent: 3582339 (1971-06-01), Martens et al.
patent: 3607345 (1971-09-01), Thomas et al.
patent: 3630742 (1971-12-01), Crawford et al.
patent: 3782947 (1974-01-01), Krall
patent: 3837886 (1974-09-01), Tatsuta et al.
patent: 3860427 (1975-01-01), Matsuo et al.
patent: 3874877 (1975-04-01), Omichi et al.
patent: 3888753 (1975-06-01), Kiikka et al.
patent: 4055685 (1977-10-01), Bayer et al.
patent: 4087574 (1978-05-01), Yamaguchi et al.
patent: 4229523 (1980-10-01), Ohta et al.
patent: 4241169 (1980-12-01), Work, III et al.
patent: 4279945 (1981-07-01), Audran et al.
patent: 4363872 (1982-12-01), Ealding
patent: 4394442 (1983-07-01), Miller
patent: 4429032 (1984-01-01), Matthe et al.
patent: 4446110 (1984-05-01), Ahlbrandt
patent: 4451497 (1984-05-01), Dolezalek et al.
patent: 4518681 (1985-05-01), Johnson et al.
patent: 4676195 (1987-06-01), Yasui et al.
patent: 4701403 (1987-10-01), Miller
patent: 4990276 (1991-02-01), Bishop et al.
patent: 4993267 (1991-02-01), Allard et al.
patent: 5004669 (1991-04-01), Yamada et al.
patent: 5147768 (1992-09-01), Sakakibara
patent: 5217804 (1993-06-01), James et al.
patent: 5229259 (1993-07-01), Yokota
patent: 5244780 (1993-09-01), Strobel et al.
patent: 5255031 (1993-10-01), Ikenoue
patent: 5295039 (1994-03-01), Nakajima et al.
patent: 5316739 (1994-05-01), Yoshikawa et al.
patent: 5425980 (1995-06-01), Grace et al.
patent: 5558843 (1996-09-01), Glocker et al.
patent: 5582921 (1996-12-01), Grace et al.
patent: 5585229 (1996-12-01), Kawamoto et al.

Affiliated with

Also associated with

Rating

Atmospheric pressure glow discharge treatment of base material f does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Atmospheric pressure glow discharge treatment of base material f, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Atmospheric pressure glow discharge treatment of base material f will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1175505