Atmospheric pressure CVD process for preparing fluorine-doped tu

Details Atmospheric pressure CVD process for preparing fluorine-doped tu Atmospheric pressure CVD process for preparing fluorine-doped tu

1993-07-06

1995-01-31

Beck, Shrive

Coating processes

Electrical product produced

Metallic compound coating

4271263, 427166, 4272552, 4272553, B05D 512, C23C 1640

Patent

active

053857518

ABSTRACT:
A film of fluorine-doped tungsten oxide is provided on a substrate by reacting together tungsten alkoxide, an oxygen-containing compound, and a fluorine-containing compound.

REFERENCES:
patent: 3216845 (1965-11-01), Brown
patent: 4500567 (1985-02-01), Kato et al.
patent: 4601917 (1986-07-01), Russo et al.
patent: 4626448 (1986-12-01), Hays
patent: 4721632 (1988-01-01), Brown
patent: 5004490 (1991-04-01), Brown
patent: 5034246 (1991-07-01), Mance et al.
patent: 5085805 (1992-02-01), Ruf
patent: 5102691 (1992-04-01), Russo et al.
patent: 5124180 (1992-06-01), Proscia
patent: 5126921 (1992-06-01), Fujishima et al.
American Nuclear Society Proceedings--The Third International Conference on CVD, 1972, pp. 215-241.

Affiliated with

Also associated with

Rating

Atmospheric pressure CVD process for preparing fluorine-doped tu does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Atmospheric pressure CVD process for preparing fluorine-doped tu, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Atmospheric pressure CVD process for preparing fluorine-doped tu will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1101285