Atmospheric pressure chemical vapor deposition apparatus

Details Atmospheric pressure chemical vapor deposition apparatus Atmospheric pressure chemical vapor deposition apparatus

1987-12-04

1989-05-30

Lawrence, Evan

Coating apparatus

Gas or vapor deposition

Multizone chamber

118715, 118725, 118729, C23C 1646, C23C 1654

Patent

active

048340200

ABSTRACT:
A conveyorized atmospheric pressure chemical vapor deposition apparatus having a heated muffle and a conveyor belt for conveying objects to be coated through said muffle. At least one chemical vapor deposition zone is provided in the muffle. An injector assembly is also provided for uniformly injecting first and second reactant gases in the deposition zone across the width of the conveyor belt and against the surfaces of the objects to be coated. The gases exit from slots connected to distribution plenums. Polished cooled surfaces are used on the injector assembly to minimize deposition of chemicals thereon.

REFERENCES:
patent: 4131659 (1978-12-01), Autnier et al.

Affiliated with

Also associated with

Rating

Atmospheric pressure chemical vapor deposition apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Atmospheric pressure chemical vapor deposition apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Atmospheric pressure chemical vapor deposition apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2144506