Asymmetrical radiation exposure of spin coated photoresist to ob

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430 5, 430 18, 430321, 430326, 430327, 430328, 430329, 430296, 430320, 3581285, 358129, 346137, 264107, G01D 1534, G03C 500, G11B 700, H04N 576

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043060137

ABSTRACT:
An improved method for replicating a spiral groove pattern. The pattern is recorded in a photoresist layer which is then developed to reproduce the pattern in the photoresist layer. The pattern is transferred to a metal layer and formed in the surface of a plastic substrate. The improvement comprises the additional steps of asymmetrically irradiating the photoresist layer and removing the irradiated photoresist surface layer to produce a photoresist layer of uniform thickness.

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Ryan, RCA Review, vol. 39, pp. 87-115, 3/78.
Firester et al., RCA Review, vol. 39, pp. 427-471, 9/78.
Albert et al., Journal of the Electrochemical Society, vol. 109, pp. 710-712, 8/62.

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