Metal founding – Process – Disposition of a gaseous or projected particulate molten...
Patent
1989-03-13
1990-03-13
Lin, Kuang Y.
Metal founding
Process
Disposition of a gaseous or projected particulate molten...
118302, 427422, 239214, B22D 2300
Patent
active
049076396
ABSTRACT:
A molten metal gas-atomizing spray-depositing apparatus employs an asymmetrical gas-atomizing device for generating one-sided shear forces for breaking-up and atomizing a stream of molten metal into metal particles in a divergent spray pattern of higher mass density at an upstream leading peripheral portion of the spray pattern, relative to the direction of movement of a substrate, than either of a center region or downstream trailing peripheral region of the pattern.
REFERENCES:
patent: Re31767 (1984-12-01), Brooks
patent: 2559351 (1951-07-01), Drake et al.
patent: 2972185 (1961-02-01), Brennan
patent: 3608615 (1971-09-01), Conlon
patent: 3727672 (1973-04-01), Grenfell
patent: 3742585 (1973-07-01), Wentzell
patent: 3775156 (1973-11-01), Singer
patent: 3826301 (1974-07-01), Brooks
patent: 3909921 (1975-10-01), Brooks
patent: 4064295 (1977-12-01), Singer
patent: 4512384 (1985-04-01), Sendzimir
patent: 4546815 (1985-10-01), Liebermann et al.
patent: 4582117 (1986-04-01), Kushnick
patent: 4588021 (1986-05-01), Bergeron et al.
patent: 4642130 (1987-02-01), Hargreaves et al.
patent: 4721154 (1988-01-01), Christ et al.
R. W. Evans et al., "The Osprey Preform Process", 1985, pp. 13-20 Powder Metallurgy, vol. 28, No. 1.
A. G. Leatham et al., "The Osprey Process For The Production Of Spray-Deposited Roll, Disc, Tube and Billet Preforms", 1985, pp. 157-173, Modern Developments In Powder Metallurgy, vols. 15-17.
Ashok Sankaranarayanan
Melillo Thomas J.
Lin Kuang Y.
Olin Corporation
LandOfFree
Asymmetrical gas-atomizing device and method for reducing deposi does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Asymmetrical gas-atomizing device and method for reducing deposi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Asymmetrical gas-atomizing device and method for reducing deposi will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-45681