X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1994-07-18
1996-04-16
Hannaher, Constantine
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 84, 378 70, G21K 700
Patent
active
055090435
ABSTRACT:
An X-ray analysis apparatus comprises a dispersive system of crystals for monochromatizing an incoming beam in a diffractometer or for analyzing an X-ray beam in an X-ray spectrometer. The system of crystals comprises crystals whose crystal lattice planes do not extend parallel to effectively reflective crystal surfaces. As a result, a substantially higher effective radiation intensity can be obtained, for example notably for (220) crystal faces in germanium.
REFERENCES:
patent: 4567605 (1986-01-01), Bartels
patent: 4821301 (1989-04-01), Cocks et al.
patent: 4928294 (1990-05-01), Beard, Jr. et al.
patent: 5287395 (1994-02-01), Khounsary
"Use of Asymmetric Dynamical Diffraction of X-Rays for Multiple-Crystal Arrangements of the (N1+N2) Setting", Kan Nakayama et al, Z. Naturforsch 28A pp. 632-638 1973.
"Materials Science with SR Using X-Ray Imaging Spatial Resolution/Source Size" M. Kuriyama, Nuclear Instruments and Methods in Physics Research A303 (1991) pp. 503-514.
"Design of High Resolution X-Ray Optical System Using Dynamical Diffraction for Synchrotron Radiation" K. Kohra et al, Nuclear Instruments and Methods 152 (1978) pp. 161-166.
"Dynamical X-Ray Diffraction from a Perfect Crystal Under Grazing Incidence Conditions" H. Hashizume et al, Review of Scientific Instruments (60) 1989 No. 7, Part 2B pp. 2373-2375.
Hannaher Constantine
Slobod Jack D.
U.S. Philips Corporation
Wong Don
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