Asymmetric group 8 (VIII) metallocene compounds

Details Asymmetric group 8 (VIII) metallocene compounds Asymmetric group 8 (VIII) metallocene compounds

2005-07-19

2005-07-19

Nazario-Gonzalez, Porfirio (Department: 1621)

Organic compounds -- part of the class 532-570 series

Organic compounds

Heavy metal containing

C556S143000, C427S587000, C427S593000

Reexamination Certificate

active

06919468

ABSTRACT:
Asymmetric, disubstituted metallocene compounds have the general formula CpMCp′ where M is a metal selected from the group consisting of Ru, Os and Fe; Cp is a first substituted cyclopentadienyl or indenyl moiety that includes at least one substituent group D1; Cp′ is a second substituted cyclopentadienyl or indenyl moiety that includes at least one substituent group D1′. D1is different from D1′. D1is X; Ca1Hb1Xc1; Ca2Hb2Xc2(C═O)Ca1Hb1Xc1; or Ca2Hb2Xc2OCa1Hb1Xc1, where X is a halogen atom or nitro group; a1 is an integer between 2 and 8; b1 is an integer between 0 and 2(a1)+1−c1; c1 is an integer between 0 and 2(a1)+1−b1; b1+c1 is at least 1; a2 is an integer between 0 and 8; b2 is an integer between 0 and 2(a2)+1−c2; and c2 is an integer between 0 and 2(a2)+1−b2; and D1′ is X; Ca1Hb1Xc1; Ca2Hb2Xc2(C═O)Ca1Hb1Xc1; or Ca2Hb2Xc2OCa1Hb1Xc1, where X is a halogen atom or nitro group; a1 is an integer between 1 and 8; b1 is an integer between 0 and 2(a2)+1−cl; c1 is an integer between 0 and 2(a1)+1−b1; b1+c1 is at least 1; a2 is an integer between 0 and 8; b2 is an integer between 0 and 2(a2)+1−c2; and c2 is an integer between 0 and 2(a2)+1−b2. The compounds can be employed as precursors in film deposition processes.

REFERENCES:
patent: 3035978 (1962-05-01), Moss et al.
patent: 6074945 (2000-06-01), Vaartstra et al.
patent: 6440495 (2002-08-01), Wade et al.
patent: 2002/0102826 (2002-08-01), Shirmamoto et al.
Peck et al., “Chemical Vapor Deposition Of Novel Precursors For Advanced Capacitor Electrodes”,Electrochemical Society, Inc., published and presented on May 14, 2002.

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