Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Processes of preparing a desired or intentional composition...
Patent
1993-04-20
1994-06-21
Lee, M. C.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Processes of preparing a desired or intentional composition...
25240021, 25240024, 524 99, 524128, 524148, 524149, 524152, 546 24, 546 25, 558156, 558158, 558166, 558167, 558179, 558183, 558186, 558194, 558204, 558218, C08K 5526
Patent
active
053228715
ABSTRACT:
Compounds of the formula I ##STR1## in which x is 1, 2 or 3, and, if x=1, R.sup.1 is C.sub.1 -C.sub.30 alkyl, C.sub.1 -C.sub.18 alkyl substituted by halogen, --COOR.sup.2, --CN, --NR.sup.3 R.sup.4 or by --CONR.sup.3 R.sup.4, C.sub.2 -C.sub.18 alkyl which is interrupted by --NR.sup.5 --, --O-- or --S--, C.sub.3 -C.sub.18 alkenyl, C.sub.5 -C.sub.12 cycloalkyl, phenyl-C.sub.1 -C.sub.4 alkyl, phenyl which is unsubstituted or substituted by C.sub.1 -C.sub.12 alkyl, halogen, phenyl-C.sub.1 -C.sub.4 alkyl and/or C.sub.1 -C.sub.4 alkoxy, or R.sub.1 is naphthyl, a radical of the formula ##STR2## R.sub.2, R.sub.3, R.sub.4 and R.sub.5, independently of one another, are hydrogen, C.sub.1 -C.sub.18 alkyl, C.sub.5 -C.sub.12 cycloalkyl or phenyl-C.sub.1 -C.sub.4 alkyl, R.sup.6 is hydrogen, methyl, allyl or benzyl, R.sup.7 is hydrogen or --OR.sup.9, R.sup.8 is hydrogen or methyl, R.sup.9 is hydrogen or C.sub.1 -C.sub.30 alkyl, R.sup.10 and R.sup.11, independently of one another, are hydrogen or C.sub.1 -C.sub.8 alkyl, and n is 3-6, with the proviso that R.sup.1 is not a phenyl radical which is substituted in both ortho-positions to the carbon atom bonded to the oxygen atom, if x=2, R.sup.1 is C.sub.2 -C.sub.18 alkylene, C.sub.2 -C.sub.18 alkylene which is interrupted by --NR.sup.5 --, --O-- or --S--, or is a ##STR3## radical, and, if x=3, R.sup.1 is C.sub.4 -C.sub.12 alkanetriyl or a ##STR4## group in which m is 1-4, are suitable as stabilisers for organic materials which are sensitive to thermal, oxidative and/or photoinduced degradation.
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Hofmann Peter
Maul Rudolf
Pitteloud Rita
Schenk Volker
Troxler Eduard
Ambrose Michael
Ciba-Geigy Corporation
Hall Luther A. R.
Lee M. C.
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