Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
Reexamination Certificate
2011-05-31
2011-05-31
Levin, Naum (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
Analysis and verification
C716S119000, C716S132000, C382S144000, C430S005000
Reexamination Certificate
active
07954071
ABSTRACT:
One embodiment of the present invention provides a system that determines an assist feature placement within a post-optical proximity correction (post-OPC) mask layout. During operation, the system receives a set of target patterns which represent a set of polygons in a pre-OPC mask layout. The system then constructs a focus-sensitive cost function based on the target patterns, wherein the focus-sensitive cost function represents an amount of movement of post-OPC contours of the target patterns in response to changes in focus condition of the lithography system. Note that the contours of the target patterns substantially coincide with the edges of set of the polygons. Next, the system computes a cost-covariance field (CCF field) based on the focus-sensitive cost function, wherein the CCF field is a two-dimensional (2D) map representing changes to the focus-sensitive cost function due to an addition of a pattern at a given location within the post-OPC mask layout. Finally, the system generates assist features for the post-OPC mask layout based on the CCF field.
REFERENCES:
patent: 4471448 (1984-09-01), Williams
patent: 6526164 (2003-02-01), Mansfield et al.
patent: 6871337 (2005-03-01), Socha
patent: 7057709 (2006-06-01), Rosenbluth
patent: 7079223 (2006-07-01), Rosenbluth et al.
patent: 7231629 (2007-06-01), Laidig
patent: 7499576 (2009-03-01), Setala
patent: 7506299 (2009-03-01), Socha et al.
patent: 7849423 (2010-12-01), Yenikaya et al.
patent: 2005/0015233 (2005-01-01), Gordon
patent: 2005/0076321 (2005-04-01), Smith
patent: 2005/0185159 (2005-08-01), Rosenbluth et al.
patent: 2005/0278686 (2005-12-01), Word et al.
patent: 2006/0190850 (2006-08-01), Kohle et al.
patent: 2006/0248495 (2006-11-01), Sezginer
patent: 2008/0138719 (2008-06-01), Park
patent: 2008/0301620 (2008-12-01), Ye et al.
patent: 2009/0004576 (2009-01-01), Furukawa
patent: 2009/0157360 (2009-06-01), Ye et al.
patent: 2009/0217218 (2009-08-01), Adam
patent: 2010/0262946 (2010-10-01), Poonawala et al.
Barnes Levi D.
Fan Yongfa
Li Jianliang
Painter Benjamin D.
Poonawala Amyn
Levin Naum
Park Vaughan Fleming & Dowler LLP
Synopsys Inc.
LandOfFree
Assist feature placement based on a focus-sensitive... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Assist feature placement based on a focus-sensitive..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Assist feature placement based on a focus-sensitive... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2701816