Assessment and optimization for metrology instrument

Details Assessment and optimization for metrology instrument Assessment and optimization for metrology instrument

2008-04-01

2008-04-01

Pham, Hoa Q. (Department: 2886)

Optics: measuring and testing

Dimension

C700S121000

Reexamination Certificate

active

07352478

ABSTRACT:
Methods and related program product for assessing and optimizing metrology instruments by determining a total measurement uncertainty (TMU) based on precision and accuracy. The TMU is calculated based on a linear regression analysis and removing a reference measuring system uncertainty (URMS) from a net residual error. The TMU provides an objective and more accurate representation of whether a measurement system under test has an ability to sense true product variation.

REFERENCES:
patent: 5835227 (1998-11-01), Grodnensky et al.
patent: 6055045 (2000-04-01), Weill et al.
patent: 2005/0222804 (2005-10-01), Archie et al.
patent: 2006/0132749 (2006-06-01), Bruls et al.

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