Assembly for processing substrates

Details Assembly for processing substrates Assembly for processing substrates

2008-04-01

2008-04-01

Moore, Karla (Department: 1792)

Coating apparatus

Gas or vapor deposition

Multizone chamber

C118S695000, C156S345240, C156S345310, C156S345320, C204S298250, C414S939000

Reexamination Certificate

active

10442181

ABSTRACT:
An assembly for processing substrates, which processing comprises a vacuum deposition process, such as, for instance, sputtering, CVD or PECVD, which vacuum deposition process is carried out in at least one process chamber, the assembly being provided with a conveying device for moving the substrates from a vacuum lock to a process chamber, the conveying device, which extends in a vacuum space, permitting a continuous conveyance of a substrate adjacent the at least one process chamber and permitting an intermittent conveyance adjacent at least the at least one vacuum lock.

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patent: 20100639 (2001-04-01), None
patent: WO 01/06030 (2001-01-01), None

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